Volatile organic compounds (VOCs) and inorganic compounds within the lithography process cause defects on reticles, hazing of scanner optics, and other serious problems that damage expensive lithography tools and can result in yield loss. The Picarro SLiM 100 Lithography Monitoring System is a 1-ppb class detection system that integrates Picarro’s industry leading cavity ring-down spectroscopy (CRDS) analyzers into a high-performance sampling system specifically for monitoring VOCs in the fab. The SLiM 100 system is a real-time measurement system that is designed to run 24/7 in the fab environment. It is a fully integrated chemical metrology system that is robust, easy-to-operate, and is ideal for use as a high-volume process monitoring and control system. The Picarro SLiM 100 has the capability to measure 10 organic compounds that negatively affect the lithography process with concentration sensitivity down to 1 part-per-billion. The system can also accommodate analyzers that measure inorganic molecules at parts-per-trillion concentration levels.